What is the metal role on the Fermi-level position at the interface with IV-IV compounds?

V. Aubry-Fortuna, J. Perrossier, M. Mamor, F. Meyer, C. Frojdh, G. Thungstrom, C. Petersson, S. Bodnar, J. Regolini
{"title":"What is the metal role on the Fermi-level position at the interface with IV-IV compounds?","authors":"V. Aubry-Fortuna, J. Perrossier, M. Mamor, F. Meyer, C. Frojdh, G. Thungstrom, C. Petersson, S. Bodnar, J. Regolini","doi":"10.1109/MAM.1997.621125","DOIUrl":null,"url":null,"abstract":"The fabrication of IV-IV alloys has generated considerable interest. The possibility of band-gap engineering has made them attractive for devices such as HBTs, MODFETs and also infrared detectors. Recently, it was shown that small amounts of C added to S/sub 1-x/Ge/sub x/ layer can offer the possibility of strain compensation to zero misfit. A tetragonal distortion associated with either a compressive strain (usually present in strained Si/sub 1-x/Ge/sub x/ layer) or a tensile strain is also provided depending on the Ge:C ratio. In this present work, we have investigated the behavior of the Schottky barrier height (SBH) on these IV-IV alloys as a function of the composition of the alloy for different layer thicknesses (above or below the critical thickness), and as a function of the metal used to realize the Schottky contact.","PeriodicalId":302609,"journal":{"name":"European Workshop Materials for Advanced Metallization,","volume":"21 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-03-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"European Workshop Materials for Advanced Metallization,","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MAM.1997.621125","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

The fabrication of IV-IV alloys has generated considerable interest. The possibility of band-gap engineering has made them attractive for devices such as HBTs, MODFETs and also infrared detectors. Recently, it was shown that small amounts of C added to S/sub 1-x/Ge/sub x/ layer can offer the possibility of strain compensation to zero misfit. A tetragonal distortion associated with either a compressive strain (usually present in strained Si/sub 1-x/Ge/sub x/ layer) or a tensile strain is also provided depending on the Ge:C ratio. In this present work, we have investigated the behavior of the Schottky barrier height (SBH) on these IV-IV alloys as a function of the composition of the alloy for different layer thicknesses (above or below the critical thickness), and as a function of the metal used to realize the Schottky contact.
金属在与IV-IV化合物界面处的费米能级位置上的作用是什么?
IV-IV合金的制造引起了相当大的兴趣。带隙工程的可能性使它们对hbt、modfet和红外探测器等设备具有吸引力。最近的研究表明,在S/sub - 1-x/Ge/sub -x/层中添加少量的C可以提供应变补偿到零失配的可能性。与压缩应变(通常存在于应变Si/sub - 1-x/Ge/sub -x/层)或拉伸应变相关的四方变形也取决于Ge:C比。在本工作中,我们研究了这些IV-IV合金上的肖特基势垒高度(SBH)作为不同层厚度(高于或低于临界厚度)合金成分的函数,以及作为用于实现肖特基接触的金属的函数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信