{"title":"Soft error rate modeling and analysis of SOI/TFT SRAM's","authors":"P. Oldiges","doi":"10.1109/SISPAD.1996.865297","DOIUrl":null,"url":null,"abstract":"Addresses methods to increase the maximum allowable gain including lifetime reduction, decreasing SOI film thickness and increasing the channel doping. The effect of lowered power supply voltages on the gain of the parasitic device and ramifications of that for the SER of SOI SRAMs is also discussed.","PeriodicalId":341161,"journal":{"name":"1996 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96 (IEEE Cat. No.96TH8095)","volume":"29 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-09-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1996 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96 (IEEE Cat. No.96TH8095)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.1996.865297","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Addresses methods to increase the maximum allowable gain including lifetime reduction, decreasing SOI film thickness and increasing the channel doping. The effect of lowered power supply voltages on the gain of the parasitic device and ramifications of that for the SER of SOI SRAMs is also discussed.