U. Gowrishetty, K. Walsh, S. Mcnamara, T. Roussel, J. Aebersold
{"title":"Single element 3-terminal pressure sensors: A new approach to pressure sensing and its comparison to the half bridge sensors","authors":"U. Gowrishetty, K. Walsh, S. Mcnamara, T. Roussel, J. Aebersold","doi":"10.1109/SENSOR.2009.5285930","DOIUrl":null,"url":null,"abstract":"We report the development of a novel 3-terminal single element piezoresistor for ultra-miniature pressure sensor applications and compare its performance to that of a traditional half Wheatstone bridge design. The pressure sensors reported here are 0.69-French in size (1F= 333µm) and are designed and batch-fabricated using SOI (silicon on insulator) and DRIE (deep reactive ion etching) technologies. One of the major applications of this device is for blood pressure monitoring using ultra-miniature 1F catheters. The combination of SOI and DRIE technologies results in uniform diaphragm thickness and complete elimination of the post-processing dicing step by micromachining “die separation streets” during the DRIE process. The novel 3-terminal single element design and half Wheatstone bridge sensors were optimized using finite element analysis (FEA). Performance characteristics of the half bridge and 3-terminal sensors, i.e. sensitivity, nonlinearity (NL%), temperature coefficient offset (TCO) and drift were measured and compared. It was determined that the 3-terminal pressure sensors (3-TPS) had greater sensitivity, better non-linearity and lower drift compared to half bridge design sensors. The 3-TPS devices were also less sensitive to alignment errors.","PeriodicalId":247826,"journal":{"name":"TRANSDUCERS 2009 - 2009 International Solid-State Sensors, Actuators and Microsystems Conference","volume":"20 11","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"TRANSDUCERS 2009 - 2009 International Solid-State Sensors, Actuators and Microsystems Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SENSOR.2009.5285930","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
We report the development of a novel 3-terminal single element piezoresistor for ultra-miniature pressure sensor applications and compare its performance to that of a traditional half Wheatstone bridge design. The pressure sensors reported here are 0.69-French in size (1F= 333µm) and are designed and batch-fabricated using SOI (silicon on insulator) and DRIE (deep reactive ion etching) technologies. One of the major applications of this device is for blood pressure monitoring using ultra-miniature 1F catheters. The combination of SOI and DRIE technologies results in uniform diaphragm thickness and complete elimination of the post-processing dicing step by micromachining “die separation streets” during the DRIE process. The novel 3-terminal single element design and half Wheatstone bridge sensors were optimized using finite element analysis (FEA). Performance characteristics of the half bridge and 3-terminal sensors, i.e. sensitivity, nonlinearity (NL%), temperature coefficient offset (TCO) and drift were measured and compared. It was determined that the 3-terminal pressure sensors (3-TPS) had greater sensitivity, better non-linearity and lower drift compared to half bridge design sensors. The 3-TPS devices were also less sensitive to alignment errors.
我们报告了一种用于超小型压力传感器应用的新型3端单元件压敏电阻的开发,并将其性能与传统的半惠斯通电桥设计进行了比较。这里报道的压力传感器尺寸为0.69 french (1F= 333µm),采用SOI(绝缘体上硅)和DRIE(深度反应离子蚀刻)技术设计和批量制造。该设备的主要应用之一是使用超小型1F导管进行血压监测。SOI技术与DRIE技术的结合使得膜片厚度均匀,并且在DRIE过程中通过微加工“模具分离街”完全消除了后处理切割步骤。采用有限元分析方法对新型三端单元件和半惠斯通电桥传感器进行了优化设计。对半桥式和三端式传感器的灵敏度、非线性(NL%)、温度系数偏移(TCO)和漂移等性能进行了测量和比较。结果表明,与半桥式传感器相比,3端压力传感器(3-TPS)具有更高的灵敏度、更好的非线性和更低的漂移。3-TPS装置对对准误差也不太敏感。