F. Bonani, G. Ghione, C. Naldi, R. D. Schnell, H. Siweris
{"title":"HEMT short-gate noise modelling and parametric analysis of NF performance limits","authors":"F. Bonani, G. Ghione, C. Naldi, R. D. Schnell, H. Siweris","doi":"10.1109/IEDM.1992.307429","DOIUrl":null,"url":null,"abstract":"The paper describes an analytical, CAD-oriented quasi-2D noise model for AlGaAs-GaAs HEMTs, based on an improved version of the Ando and Itoh approach (see IEEE Trans. on Electron Devices, vol. ED-37, no. 1, p. 67-78, 1990). The model was validated through comparison with DC, AC and noise measurements carried out on both standard 0.5 mu m (HEMT30) and advanced 0.25 mu m (HEMT40) SIEMENS HEMTs. On the basis of the SIEMENS HEMT structure, a scaling study was performed to extrapolate the performance limits of this technology with decreasing gate length in the range 0.5-0.1 mu m. The extension of the model to pseudomorphic and double-channel HEMT's is in progress.<<ETX>>","PeriodicalId":287098,"journal":{"name":"1992 International Technical Digest on Electron Devices Meeting","volume":"34 1-2","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1992 International Technical Digest on Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.1992.307429","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
The paper describes an analytical, CAD-oriented quasi-2D noise model for AlGaAs-GaAs HEMTs, based on an improved version of the Ando and Itoh approach (see IEEE Trans. on Electron Devices, vol. ED-37, no. 1, p. 67-78, 1990). The model was validated through comparison with DC, AC and noise measurements carried out on both standard 0.5 mu m (HEMT30) and advanced 0.25 mu m (HEMT40) SIEMENS HEMTs. On the basis of the SIEMENS HEMT structure, a scaling study was performed to extrapolate the performance limits of this technology with decreasing gate length in the range 0.5-0.1 mu m. The extension of the model to pseudomorphic and double-channel HEMT's is in progress.<>