InGaAs MOSFET source structures toward high speed/low power applications

Y. Miyamoto, T. Kanazawa, Y. Yonai, Atsushi Kato, M. Fujimatsu, M. Kashiwano, K. Ohsawa, K. Ohashi
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引用次数: 1

Abstract

High on-currents (Ion) and low off-currents (Ioff) under low supply voltage are important for logic applications. A heavily doped InP source was introduced to demonstrate the existence of high Ion in InGaAs MOSFETs, and ID = 2.4 mA/μm at VD = 0.5 V was observed. GaAsSb source was introduced in InGaAs tunnel FET to realize low Ioff. Narrow channel body was found to be essential for steep sub-threshold (SS) dependence, and a fabricated GaAsSb/InGaAs vertical tunnel FET with a 26 nm wide body showed steep SS. In addition, an InGaAs/InP super-lattice source was studied to consider the possibility of simultaneous high Ion and low Ioff realization.
面向高速/低功耗应用的InGaAs MOSFET源结构
低电源电压下的高通流(Ion)和低关断电流(Ioff)对于逻辑应用非常重要。引入重掺杂的InP源,证明了InGaAs mosfet中存在高离子,在VD = 0.5 V时,观察到ID = 2.4 mA/μm。在InGaAs隧道场效应管中引入GaAsSb源以实现低关断。窄通道体是陡亚阈值依赖性的必要条件,制备的26 nm宽体的GaAsSb/InGaAs垂直隧道场效应管显示陡亚阈值依赖性。此外,研究了InGaAs/InP超晶格源,以考虑同时实现高离子和低off的可能性。
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