Patterning of electroless copper deposition on low temperature co-fired ceramic

Dilshani Rathnayake-Arachchige, D. Hutt, P. Conway, M. D’Auria, S. Lucyszyn, R. Lee, I. Robertson
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引用次数: 1

Abstract

The metallization of low temperature co-fired ceramic (LTCC) is typically done with commercially available silver or gold pastes using conventional screen printing processes. However, for some applications such as substrate integrated waveguides and high performance planar components where the metallization of vertical side walls is required, screen printing is difficult to apply. In such cases, electroless plating of copper can be employed to metallize the fired LTCC, which would also be a promising alternative to the high cost metals such as Ag and Au. In this study, electroless copper plating was combined with KrF excimer laser machining to deposit selective copper patterns on fired LTCC. Using this approach, a functional circuit was fabricated and electrically tested. The mask projection technique of the excimer laser can be used to create complex patterns on LTCC and initial work has been carried out to realize planar passive component layouts, including a capacitor and an inductor. The minimum feature size of the deposited copper that could be achieved in these designs was below 50 μm.
低温共烧陶瓷上化学镀铜的图像化
低温共烧陶瓷(LTCC)的金属化通常是用商业上可用的银或金糊使用传统的丝网印刷工艺完成的。然而,对于一些应用,如基板集成波导和高性能平面元件,这些应用需要垂直侧壁的金属化,丝网印刷很难应用。在这种情况下,化学镀铜可以用来使燃烧的LTCC金属化,这也将是一个有希望的替代高成本金属,如银和金。在本研究中,化学镀铜与KrF准分子激光加工相结合,在燃烧的LTCC上沉积选择性铜图案。利用这种方法,制作了一个功能电路并进行了电气测试。准分子激光的掩模投影技术可以在LTCC上产生复杂的图案,并且已经进行了初步的工作来实现平面无源元件布局,包括电容器和电感器。在这些设计中,沉积铜的最小特征尺寸小于50 μm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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