Device drive current degradation observed with retrograde channel profiles

S. Venkatesan, J. Lutze, C. Lage, W. Taylor
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引用次数: 26

Abstract

Super steep retrograde channel profiles have been widely known to produce improved short channel characteristics in sub-0.35 /spl mu/m CMOS technologies. In this paper, an attempt is made to leverage this improved short channel behaviour and thereby improve transistor performance (as measured by the current drive). Whereas significant improvements in short channel effects measured by DIBL and /spl Delta/Vt/sub sat/ are obtained with retrograde channels, it is observed that for a fixed gate length and equal threshold voltage, transistors with retrograde channel profiles typically exhibit lower drive currents than equivalent transistors fabricated with conventional doping profiles. Potential trade offs in device design resulting from this observation are discussed.
用逆行通道剖面观察到的器件驱动电流退化
众所周知,在低于0.35 /spl mu/m的CMOS技术中,超陡的逆行通道轮廓可以改善短通道特性。在本文中,尝试利用这种改进的短通道行为,从而提高晶体管性能(由电流驱动测量)。虽然使用逆行通道可以显著改善DIBL和/spl Delta/Vt/sub - sat/测量的短通道效应,但可以观察到,对于固定栅极长度和等阈值电压,使用逆行通道的晶体管通常比使用常规掺杂配置的等效晶体管表现出更低的驱动电流。讨论了由此观察到的设备设计中的潜在权衡。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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