DFM aware bridge pair extraction for manufacturing test development

Sarveswara Tammali, V. Khatri, G. Shanmugam, M. Terry
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Abstract

We propose a novel method to extract bridge pairs for manufacturing test development based on litho hotspots obtained from DFM (Design-For-Manufacturability) litho models. Litho hotspots are locations in a physical layout in which the lithography process margin is relatively small. We use a DFM lithography simulator to identify litho hotspots and map them onto the design database to identify the associated nets. These nets are then used to select prioritized bridging pairs from extracted capacitive coupling based bridge pairs.
面向制造测试开发的DFM感知桥对提取
我们提出了一种基于从DFM (Design-For-Manufacturability)光刻模型中获得的光刻热点提取用于制造测试开发的桥对的新方法。光刻热点是物理布局中光刻工艺余量相对较小的位置。我们使用DFM光刻模拟器来识别光刻热点,并将它们映射到设计数据库中以识别相关的网络。然后使用这些网络从提取的基于电容耦合的桥接对中选择优先的桥接对。
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