Methodology for predicting C4 non-wets during the chip attach process

V. D. Khanna, S. M. Sri-Jayantha
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引用次数: 6

Abstract

Balancing the level of substrate warp at reflow with other sources contributing to C4 non-wets is an important problem. To address this, a methodology to predict the probability of non-wets during the chip attach process of an organic package has been developed. A technique for quantifying the convex or concave warp of a substrate in the form of a Shape Inversion (SI) plot is introduced. Geometrical factors that influence non-wets such as C4 height, the pad's relative location, collapsed solder height etc. are described and their individual contributions to the non-wet conditions are computed. Combining these contributions onto the SI plot allows for a graphical representation of the non-wet probability. The technique is applied to a product substrate and the results compared with the actual yield observed during chip assembly.
在贴片过程中预测C4非湿性的方法
平衡基材在回流时的翘曲水平和其他导致C4非湿的来源是一个重要的问题。为了解决这个问题,开发了一种方法来预测有机封装芯片附着过程中非湿的概率。介绍了一种以形状反演(SI)图的形式量化衬底凸或凹翘曲的技术。描述了影响非湿条件的几何因素,如C4高度、焊盘的相对位置、焊料坍塌高度等,并计算了它们对非湿条件的各自贡献。将这些贡献组合到SI图上,可以用图形表示非湿概率。将该技术应用于产品衬底,并将结果与芯片组装过程中观察到的实际良率进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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