Ultra-Short-Channel Characteristics of Planar MOSFETs With Block Oxide

Jyi-Tsong Lin, Y. Eng, Kuo-Dong Huang, Tai-Yi Lee, Kao-Cheng Lin
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引用次数: 5

Abstract

In this work, the investigation of block oxide used in planar MOSFETs has been studied. To solve these above issues and for the comparison, we propose two novel device architectures; one is called the FDSOI with block oxide (bFDSOI) and the other is called the Si on partial insulator with block oxide field-effect transistor (bSPIFET)
块氧化平面mosfet的超短沟道特性
本文主要研究了块氧化物在平面mosfet中的应用。为了解决上述问题并进行比较,我们提出了两种新的器件架构;一种是带块氧化物的FDSOI (bFDSOI),另一种是带块氧化物的部分绝缘体硅场效应晶体管(bSPIFET)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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