N. Anderson, G. Vereecke, M. Heyns, P. Espitalier-Noel
{"title":"Metallic contaminants generation from tubing during start-up and following moisture upsets in HCl distribution systems","authors":"N. Anderson, G. Vereecke, M. Heyns, P. Espitalier-Noel","doi":"10.1109/ISSM.1997.664629","DOIUrl":null,"url":null,"abstract":"Contamination control has always been an important issue for IC manufacturing processes. Within the area of corrosive gas distribution, metallic contamination is a constant threat to process yield. This paper focuses on metallic contamination resulting from low pressure HCl gas flow through tubing materials during system start-up and following exposure to moisture. The paper discusses the effect of HCl exposure on two tubing materials. Data relating to the type, physical state, and concentration of metallic contamination is included. Surface chemistry mechanisms are proposed in relation to the observed phenomena. The comparison of two tubing materials permits performance, cost and design implications to be considered.","PeriodicalId":138267,"journal":{"name":"1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-10-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.1997.664629","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Contamination control has always been an important issue for IC manufacturing processes. Within the area of corrosive gas distribution, metallic contamination is a constant threat to process yield. This paper focuses on metallic contamination resulting from low pressure HCl gas flow through tubing materials during system start-up and following exposure to moisture. The paper discusses the effect of HCl exposure on two tubing materials. Data relating to the type, physical state, and concentration of metallic contamination is included. Surface chemistry mechanisms are proposed in relation to the observed phenomena. The comparison of two tubing materials permits performance, cost and design implications to be considered.