{"title":"Processing of platinum electrodes for parylene-C based neural probes","authors":"Xiao Chuan Ong, M. Forssell, G. Fedder","doi":"10.1109/MEMSYS.2016.7421673","DOIUrl":null,"url":null,"abstract":"This paper reports a method to improve the electrochemical properties of platinum electrodes fabricated using parylene-C based processes. It is found that the use of O2 reactive-ion etch to etch parylene-C, the state-of-the-art method for processing parylene-C, oxidizes a surface layer of platinum, which results in high electrochemical impedance of the electrode. By introducing an Ar+ ion milling step, the electrochemical impedance of the electrode is reduced by an order of magnitude. The surface roughness of the electrodes (Ra) using this method of de-insulation is found to be 13.1 nm.","PeriodicalId":157312,"journal":{"name":"2016 IEEE 29th International Conference on Micro Electro Mechanical Systems (MEMS)","volume":"10 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-02-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE 29th International Conference on Micro Electro Mechanical Systems (MEMS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MEMSYS.2016.7421673","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6
Abstract
This paper reports a method to improve the electrochemical properties of platinum electrodes fabricated using parylene-C based processes. It is found that the use of O2 reactive-ion etch to etch parylene-C, the state-of-the-art method for processing parylene-C, oxidizes a surface layer of platinum, which results in high electrochemical impedance of the electrode. By introducing an Ar+ ion milling step, the electrochemical impedance of the electrode is reduced by an order of magnitude. The surface roughness of the electrodes (Ra) using this method of de-insulation is found to be 13.1 nm.