SRAM cell current in low leakage design

D. Kwai, Ching-Hua Hsiao, C. Kuo, C. Chuang, M. Hsu, Yi-Chun Chen, Yu-Ling Sung, H. Pan, Chia-Hsin Lee, Meng-Fan Chang, Yung-Fa Chou
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引用次数: 2

Abstract

This paper highlights the cell current characterization of a low leakage 6T SRAM by adjusting the threshold voltages of the transistors in the memory array to reduce the standby power. Experiments using a 0.25 mum 2.5V standard CMOS process with and without the additional threshold voltage adjustment implant on a 1Mb test chip demonstrate the effectiveness. A substantial standby power reduction by an order of magnitude is achievable. However, it incurs a wider cell current variation, which is pronounced only at a lower supply voltage. As the supply voltage decreases, the percent deviation from the average value increases. This can be modeled by a simple power-law relationship. The result has important implications in both design and manufacturing of the low leakage SRAM. Comparing with the generic cell current without the additional threshold voltage adjustment, the crossover point of their percent deviations at 2V signifies two separate circuit strategies: operating at 1.5V requires larger sensing margin and operating at 2.5V enjoys better manufacturability. Hence, for the applications requiring low voltage operations, it favors a boosted supply voltage applied to a selected cell during the read access
SRAM电池电流低漏设计
本文重点研究了通过调节存储器阵列中晶体管的阈值电压来降低待机功率的低漏损6T SRAM的电池电流特性。采用0.25 μ m 2.5V标准CMOS工艺,在1Mb测试芯片上植入或不植入附加阈值电压调整,验证了该方法的有效性。大量的待机功率降低一个数量级是可以实现的。然而,它会引起更大的电池电流变化,这只有在较低的电源电压下才会明显。随着电源电压的降低,偏离平均值的百分比增加。这可以用一个简单的幂律关系来建模。研究结果对低泄漏SRAM的设计和制造具有重要的指导意义。与没有附加阈值电压调整的一般电池电流相比,它们在2V时百分比偏差的交叉点表示两种不同的电路策略:工作在1.5V时需要更大的传感裕度,工作在2.5V时具有更好的可制造性。因此,对于需要低电压操作的应用,它倾向于在读取访问期间将升压的电源电压施加到选定的单元
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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