Alternate Conductive Atomic Force Microscope with Scanning Capacitance Microscope to Catch Hidden Defect

Abstract

This paper described how to use conductive atomic force microscope (C-AFM) and scanning capacitance microscope (SCM) alternately to catch very tiny and cunning defect modes hidden in the indiscernible corner. These schemes are easily implemented with standard equipment already present in most failure analysis laboratories, and could overcome some encountered judge problems