{"title":"Device and technology challenges for 0.1 /spl mu/m CMOS","authors":"S.S. Wong","doi":"10.1109/HKEDM.1997.641997","DOIUrl":null,"url":null,"abstract":"Summary form only given. The integrated circuit industry is poised to introduce 0.25 /spl mu/m products before the end of this year, and is projected to deliver 0.1 /spl mu/M process in less than 10 years. We will review the challenges ahead and focus on the research opportunities in device and process technology.","PeriodicalId":262767,"journal":{"name":"1997 IEEE Hong Kong Proceedings Electron Devices Meeting","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-08-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1997 IEEE Hong Kong Proceedings Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/HKEDM.1997.641997","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Summary form only given. The integrated circuit industry is poised to introduce 0.25 /spl mu/m products before the end of this year, and is projected to deliver 0.1 /spl mu/M process in less than 10 years. We will review the challenges ahead and focus on the research opportunities in device and process technology.