{"title":"Characteristics of an improved lateral emitter switched thyristor","authors":"Wei Chen, G. Amaratunga","doi":"10.1109/ISPSD.1995.515074","DOIUrl":null,"url":null,"abstract":"A new LEST (lateral emitter switched thyristor) structure is proposed and experimentally verified. The structure differs from the conventional LEST in that it embeds a floating ohmic contact between the n-drift region and the n+ floating emitter. Both simulation and experimental results show that the device has an enhanced turn-on capability compared with the conventional LEST without deteriorating the other characteristics. The device is fabricated using a 3 /spl mu/m CMOS process to have a 320 V breakdown and 0.7 V threshold voltage. Thyristor turn-on is observed at an anode current density of 12.5 A/cm/sup 2/ with 5 V gate voltage. The maximum MOS controllable current density is in excess of 200 A with 5 V gate voltage.","PeriodicalId":200109,"journal":{"name":"Proceedings of International Symposium on Power Semiconductor Devices and IC's: ISPSD '95","volume":"43 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of International Symposium on Power Semiconductor Devices and IC's: ISPSD '95","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.1995.515074","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
A new LEST (lateral emitter switched thyristor) structure is proposed and experimentally verified. The structure differs from the conventional LEST in that it embeds a floating ohmic contact between the n-drift region and the n+ floating emitter. Both simulation and experimental results show that the device has an enhanced turn-on capability compared with the conventional LEST without deteriorating the other characteristics. The device is fabricated using a 3 /spl mu/m CMOS process to have a 320 V breakdown and 0.7 V threshold voltage. Thyristor turn-on is observed at an anode current density of 12.5 A/cm/sup 2/ with 5 V gate voltage. The maximum MOS controllable current density is in excess of 200 A with 5 V gate voltage.