F. Utermohlen, D. B. Etter, David Borowsky, I. Herrmann, C. Schelling, F. Hutter, S. Sun, J. Burghartz
{"title":"Low-cost microbolometer with nano-scaled plasmonic absorbers for far infrared thermal imaging applications","authors":"F. Utermohlen, D. B. Etter, David Borowsky, I. Herrmann, C. Schelling, F. Hutter, S. Sun, J. Burghartz","doi":"10.1109/MEMSYS.2014.6765705","DOIUrl":null,"url":null,"abstract":"We present a scalable low-cost microbolometer technology platform which is based on separate fabrication of MEMS and read-out ASIC CMOS wafers. Mechanical, electrical and hermetical connection is achieved by Cu-based thermocompression bonding. The performance loss due to the resulting backside illumination of the sensor is compensated by an optimized microbolometer design including nano-scaled plasmonic absorbers, a dedicated pixel geometry and the use of highly temperature sensitive devices. The low-cost approach features CMOS compatible MEMS processes, wafer level packaging and uncooled operation of the sensor.","PeriodicalId":312056,"journal":{"name":"2014 IEEE 27th International Conference on Micro Electro Mechanical Systems (MEMS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-03-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 IEEE 27th International Conference on Micro Electro Mechanical Systems (MEMS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MEMSYS.2014.6765705","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
We present a scalable low-cost microbolometer technology platform which is based on separate fabrication of MEMS and read-out ASIC CMOS wafers. Mechanical, electrical and hermetical connection is achieved by Cu-based thermocompression bonding. The performance loss due to the resulting backside illumination of the sensor is compensated by an optimized microbolometer design including nano-scaled plasmonic absorbers, a dedicated pixel geometry and the use of highly temperature sensitive devices. The low-cost approach features CMOS compatible MEMS processes, wafer level packaging and uncooled operation of the sensor.