The ES-MGBT: a new fast switching MOS-gated power bipolar transistor with conductivity-modulation by a positive feedback mechanism

J. Ajit, D. Kinzer
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引用次数: 2

Abstract

A new MOS-gated device structure called the ES-MGBT is described which consists of P/sup +/ and N/sup +/ emitters, both of which are in emitter-switched configuration. In the ES-MGBT, a P/sup +/ injector coupled to the drain potential by a vertical driver DMOSFET is used to inject holes. A novel cell design is used to divert the injected holes to conductivity modulate the driver DMOSFET resulting in a low on-state voltage drop by a positive feedback mechanism. In addition, the bipolar transistor components of the device are placed in an emitter-switched configuration by the cell design which results in fast switching, high avalanche capability, and fully gate controlled characteristics. 750 V ES-MGBT devices fabricated along with DMOSFET devices on the same wafer showed 25% improvement in current density at room temperature and 36% improvement at 75/spl deg/C at a forward drop of 3.5 V. The turn-off time of the ES-MGBT was 80 ns - equal to that of the DMOSFET.
ES-MGBT是一种新型快速开关mos门控功率双极晶体管,其电导率由正反馈机制调制
描述了一种新的mos门控器件结构ES-MGBT,它由P/sup +/和N/sup +/发射器组成,两者都是发射器开关配置。在ES-MGBT中,P/sup +/注入器通过垂直驱动DMOSFET耦合到漏极电势,用于注入孔。采用一种新颖的电池设计,通过正反馈机制将注入孔转移到电导率调制驱动DMOSFET,从而实现低导通电压降。此外,该器件的双极晶体管组件通过单元设计放置在发射器开关配置中,从而实现快速开关,高雪崩能力和完全栅极控制特性。与DMOSFET器件一起制作的750 V ES-MGBT器件在室温下的电流密度提高了25%,在75/spl度/C下,正向下降3.5 V,电流密度提高了36%。ES-MGBT的关断时间为80ns,与DMOSFET的关断时间相等。
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