{"title":"Smart pockets-total suppression of roll-off and roll-up [MOSFET doping]","authors":"R. Gwoziecki, T. Skotnicki","doi":"10.1109/VLSIT.1999.799355","DOIUrl":null,"url":null,"abstract":"We have demonstrated that with use of pocket implants, there exists an asymptotic threshold voltage-gate length (V/sub th/-L) curve which can only be shifted to shorter device lengths if a larger amount of roll-up and steeper roll-off are allowed. This inherent feature of conventional pockets narrows the technological window for sub-0.1 /spl mu/m MOSFETs. Therefore, we propose a new concept called \"smart pockets\", enabling total annihilation of roll-up and roll-off and thus offering a perfectly flat V/sub th/-L dependence down to the desired gate length.","PeriodicalId":171010,"journal":{"name":"1999 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.99CH36325)","volume":"17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"17","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1999 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.99CH36325)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.1999.799355","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 17
Abstract
We have demonstrated that with use of pocket implants, there exists an asymptotic threshold voltage-gate length (V/sub th/-L) curve which can only be shifted to shorter device lengths if a larger amount of roll-up and steeper roll-off are allowed. This inherent feature of conventional pockets narrows the technological window for sub-0.1 /spl mu/m MOSFETs. Therefore, we propose a new concept called "smart pockets", enabling total annihilation of roll-up and roll-off and thus offering a perfectly flat V/sub th/-L dependence down to the desired gate length.