New bonding material for power devices with high bonding strength for operating high temperature

S. Sekine, Ryuji Kimura, K. Okada, H. Shindo, T. Ooi, U. Itoh
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Abstract

In the metallization technology for power electronic device, it has been required to develop new material for operating high-temperature at 300 °C and interconnection with high bonding strength. We have developed new method to fabricate fine metal alloy particles with narrow distribution of particle size from 0.5 to 10μm. We called it as Nanomized method. The fine particles are composed of uniform structure dispersed metal alloy in nano-scale level and do not include void in the particle. We produced bonding material from the mixture of Cu particles and Sn-based nano composite solder particles. The bonding strength of die chip on Al electrode reached 80 MPa as a top data, 50 MPa in average after 500 thermal cycles from -40 to 250 °C.
大功率器件用新型粘接材料,高温工作时粘接强度高
在电力电子器件金属化技术中,要求开发出能在300℃高温下工作并具有高键合强度的互连新材料。我们开发了一种新的方法来制备粒度分布在0.5 ~ 10μm之间的细金属合金颗粒。我们称之为纳米化方法。细颗粒由纳米级均匀结构的分散金属合金组成,颗粒中不含空洞。我们用铜颗粒和锡基纳米复合焊料颗粒的混合物制备了键合材料。在-40 ~ 250℃的温度范围内,经过500次热循环,铝电极上的晶片结合强度最高达到80 MPa,平均达到50 MPa。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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