Formation of solder cap on Cu pillar bump using formic acid reduction

Masaru Monta, K. Okiyama, T. Sakai, N. Imaizumi
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引用次数: 11

Abstract

In this paper, we report a reflow process that uses formic acid to rem ove the native oxide of a so lder on a Cu pillar instead of using flux. To study the effect of the solder on the Cu pillar, we compare the shape and the crystal structure of a wetted solder on a Cup illar afterareflo w process using formic acid and flux. To conduct the experiment, we also had to confirm the effect of the in termetallic compound layer between a solder and a Cu pillar. Therefore, we prepared the sample with a Ni layer between a so lder and a C u pillar to prevent the formation of an intermetallic compound layer. Both samples with/without Ni layer were investigated simultaneously. The results showed that the solder which was fabricated by a reflow process using formic acid crystalized even at a peak temperature of 228 °C, which is ciò se to the solder melting temperature. There was no difference in the reduction abilities between formic acid an d flux in the wettability test o f the solder. However, it was found that the amount of formic acid are proportional to the reflow temperature. Atmosphere of formic acid is main factor of raising peak temperature of reflow.
用甲酸还原法在铜柱凸包上形成焊锡帽
在本文中,我们报告了一种用甲酸代替助熔剂使铜柱上的有机氧化物脱除的回流工艺。为了研究焊料对铜柱的影响,我们比较了用甲酸和助焊剂回流后杯柱上湿润焊料的形状和晶体结构。为了进行实验,我们还必须确认焊料和铜柱之间的金属三元化合物层的影响。因此,我们在镍柱和钴柱之间制备了镍层,以防止金属间化合物层的形成。同时研究了带/不带Ni层的两种样品。结果表明,甲酸回流法制备的焊料在峰值温度为228℃时仍有结晶,与焊料熔化温度的关系为ciò。在焊料的润湿性试验中,甲酸和助焊剂的还原能力没有差异。然而,我们发现甲酸的用量与回流温度成正比。甲酸气氛是提高回流峰温度的主要因素。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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