Noise characteristics of dual-gate AlGaAs/InGaAs pHEMTs

Chih-Chan Hu, Y. Hsin, D. Lin, Chien-Chang Huang, Cheng-Kuo Lin, Yu-Chi Wang
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Abstract

In this study, we compare the noise characteristics of dual-gate AlGaAs/InGaAs pHEMTs in the frequency range of 1 to 18 GHz. The studied devices including dual-gate enhancement-/enhancement-mode (E/E-mode) and enhancement-/depletion-mode (E/D-mode) pHEMTs were fabricated on the same wafer by the different gate metallization. The minimum noise figure (NFmin) and associated gain (GA) are discussed with power and linearity performance at the same bias conditions. The dual-gate E/E- and E/D-mode devices have demonstrated low noise and high gain performance, and are equivalent to the cascode configuration for compact size as compared to a cascode low noise amplifier.
双栅AlGaAs/InGaAs pHEMTs的噪声特性
在本研究中,我们比较了双栅AlGaAs/InGaAs phemt在1至18 GHz频率范围内的噪声特性。本文研究的器件包括双栅增强/增强模式(E/E-mode)和增强/耗尽模式(E/D-mode) phemt,采用不同的栅极金属化方法在同一晶片上制备。讨论了在相同偏置条件下,最小噪声系数(NFmin)和相关增益(GA)与功率和线性性能的关系。双栅极E/E-和E/ d模式器件具有低噪声和高增益性能,与级联低噪声放大器相比,其尺寸紧凑,相当于级联码配置。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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