A test structure for reliability analysis of CMOS devices under DC and high frequency AC stress

T. Matsuda, K. Ichihashi, H. Iwata, T. Ohzone
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引用次数: 4

Abstract

A test structure for reliability analysis of MOSFETs in CMOS inverters under DC and high frequency AC stress has been presented. It has an input pulse generation block with a ring oscillator, monitor inverter blocks and Kelvin connected selector switches. Detailed I - V characteristics of MOSFETs in the monitor inverters were measured and the degradation by HCI and BTI in nMOS and pMOS devices were analyzed. The dominant degradation origins in nMOS and pMOS devices can be attributed to HCI and NBTI, respectively.
一种用于分析CMOS器件在直流和高频交流应力下可靠性的测试结构
提出了一种用于分析CMOS逆变器中mosfet在直流和高频交流应力下可靠性的测试结构。它有一个带环形振荡器的输入脉冲产生块,监视器逆变块和开尔文连接的选择开关。详细测量了监控逆变器中mosfet的I - V特性,并分析了nMOS和pMOS器件中HCI和BTI的退化。nMOS和pMOS器件的主要降解源分别可归因于HCI和NBTI。
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