High bonding strength of silver sintered joints on non-precious metal surfaces by pressure sintering under air atmosphere using micro-silver sinter paste

Ly May Chew, W. Schmitt, M. Dubis
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引用次数: 4

Abstract

Owing to its superb properties such as high melting temperature, high thermal and electrical conductivity, silver sintering is considered as a promising die attach technology in recent years for high power electronics packaging with demanding requirements such as high power density, high current capacity and high operating temperature. Our previous studies have demonstrated the feasibility of semiconductor devices attachment on silver, gold and copper surfaces by silver sintering. Eliminating precious metal finishing on substrate would represent significant compatibility to present supply chain and lower the entry barrier to adopt silver sinter solution. In this paper, we extended our study to semiconductor devices attachment on non-precious metal surfaces by pressure sintering process in air atmosphere. We attached Ag metallized Si dies on direct copper bonding substrates with nickel plated and without plating as well as on aluminum plate by silver sintering process at $250^{\circ}\mathrm{C}$ with a pressure of 10 MPa for 3 min using a newly developed silver sinter paste. We demonstrate that it is feasible to create high bonding strength of silver sintered joint on Ni, Al and Cu surfaces with an average die shear strength above 15 N/mm$^{2}$. The die shear failure mode shows that cohesive break in the sintered layer was obtained for all the samples. SEM-EDX results further confirmed that silver sintered joint was formed on Ni, Al and Cu surfaces with an interdiffusion between Ag and Ni, Ag and Al as well as Ag and Cu. SAM was performed on the samples after pressure sintering and the SAM images clearly illustrate that void, drying channel and delamination in the silver sintered layer were not observed.
用微银烧结膏在空气气氛下压力烧结制备了非贵金属表面高强度银烧结接头
银烧结由于其高熔点、高导热性和高导电性等优良性能,近年来被认为是一种有前途的高功率电子封装技术,适用于高功率密度、大电流容量和高工作温度等要求。我们之前的研究已经证明了通过银烧结在银、金和铜表面上附着半导体器件的可行性。消除基材上的贵金属精加工将对现有供应链具有重要的兼容性,并降低采用银烧结溶液的进入门槛。在本文中,我们将研究扩展到非贵金属表面的半导体器件在空气气氛中的压力烧结工艺。采用新研制的银烧结浆料,在$250^{\circ}\ mathm {C}$的压力下,在10 MPa的压力下,用银烧结工艺将银金属化Si模连接在镀镍和未镀镍的直接铜键合基板和铝板上。结果表明,在Ni、Al和Cu表面制备高强度银烧结接头是可行的,平均模剪强度在15 N/mm以上。模具剪切破坏模式表明,所有试样的烧结层均出现内聚断裂。SEM-EDX结果进一步证实,在Ni、Al和Cu表面形成了银烧结接头,银与Ni、银与Al、银与Cu相互扩散。对压烧结后的样品进行了SAM成像,清晰地显示了银烧结层中没有空洞、干燥通道和分层现象。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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