Stability of Ni/sub 3/P and its effect on the interfacial reaction between electroless Ni-P and molten tin

K. Chen, C. Liu, D. Whalley, D. Hutt
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引用次数: 1

Abstract

The stability of Ni/sub 3/P and its effect on the reaction with molten tin were evaluated in the present study by comparing the reaction behaviour of Ni-P coatings in the as-plated and heat-treated conditions. It was found that after the solder reaction a dark layer of Ni/sub 3/P was formed at the interface on Ni-P coatings in both conditions, but its thickness was thinner on heat-treated coatings than on as-plated coatings. From the compositional analysis on the cross-sections, it was found that not all the P ejected from the interfacial reaction between Sn and Ni-P was consumed by the formation of Ni/sub 3/P, as P was detected in a second layer of interfacial phase which also contained Ni and Sn. The formation of Ni/sub 3/P was found to be characteristic of a diffusion process, whilst the thickness of Ni-P coating consumed during the reaction was found to be linearly proportional to the reaction time. It is concluded that the Ni/sub 3/P phase formed during the solder reaction is not stable and therefore cannot act as an effective barrier to reactions with liquid solders.
Ni/sub /P的稳定性及其对化学镀Ni-P与熔融锡界面反应的影响
通过比较Ni-P涂层在镀态和热处理条件下的反应行为,评价了Ni/sub - 3/P的稳定性及其对与熔融锡反应的影响。结果表明:在两种条件下,Ni-P镀层的界面处均形成了一层Ni/sub - 3/P黑色镀层,但其厚度较镀态镀层薄。从截面上的成分分析中发现,Sn与Ni-P界面反应中喷射出的P并没有全部被Ni/sub - 3/P的形成所消耗,因为P存在于含有Ni和Sn的第二层界面相中。发现Ni/sub - 3/P的形成具有扩散过程的特征,而反应过程中消耗的Ni-P涂层厚度与反应时间成线性正比。结果表明,在焊料反应过程中形成的Ni/sub 3/P相不稳定,因此不能作为与液态焊料反应的有效屏障。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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