Multi-Level Air Gap Integration for 32/22nm nodes using a Spin-on Thermal Degradable Polymer and a SiOC CVD Hard Mask

Abstract

In this work, we propose and verify a robust dual damascene air gap architecture, which avoids the increasing complexity and cost normally associated with current multilevel air gap integration. Air gap packaging reliability was also addressed showing promising stud bonding and wire pull test results. Furthermore two solutions are proposed to solve any possible un-landed via issues, including simultaneous air gap formation at multiple metal levels, which could even be used to reduce the thermal budget for the 32/22 nm nodes.