Non-Classical Hot-Electron Gate Current in the Deep Submicrometer N-MOS Flash Memory Cell

Y. Zhang, D. Ang, H.P. Kuan, K. Tan
{"title":"Non-Classical Hot-Electron Gate Current in the Deep Submicrometer N-MOS Flash Memory Cell","authors":"Y. Zhang, D. Ang, H.P. Kuan, K. Tan","doi":"10.1109/IPFA.2006.251001","DOIUrl":null,"url":null,"abstract":"In this paper, experimental features of a non-classical hot-electron gate current I<sub>g</sub> <sup>e</sup> obtained under V<sub>b</sub> = 0, similar to those reported earlier under reverse V<sub>b</sub> are presented. To the best of our knowledge, this is the first direct observation of this non-classical I<sub>g</sub> <sup>e</sup> component in deep submicrometer N-channel MOSFET under conventional CHE biasing, i.e. when V<sub>g</sub> ap V<sub>d</sub> and V<sub>b</sub> = 0. Based on the results, a phenomenological explanation as well as some further supporting experimental evidence is also presented here","PeriodicalId":283576,"journal":{"name":"2006 13th International Symposium on the Physical and Failure Analysis of Integrated Circuits","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 13th International Symposium on the Physical and Failure Analysis of Integrated Circuits","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPFA.2006.251001","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

In this paper, experimental features of a non-classical hot-electron gate current Ig e obtained under Vb = 0, similar to those reported earlier under reverse Vb are presented. To the best of our knowledge, this is the first direct observation of this non-classical Ig e component in deep submicrometer N-channel MOSFET under conventional CHE biasing, i.e. when Vg ap Vd and Vb = 0. Based on the results, a phenomenological explanation as well as some further supporting experimental evidence is also presented here
深亚微米N-MOS快闪存储单元中的非经典热电子门电流
本文给出了在Vb = 0条件下得到的非经典热电子栅电流Ig e的实验特征,与之前报道的逆Vb条件下的实验特征相似。据我们所知,这是在传统CHE偏置下,即当Vg ap Vd和Vb = 0时,在深亚微米n沟道MOSFET中首次直接观察到这种非经典Ig成分。在此基础上,提出了现象学解释和进一步的实验证据
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信