Design and fabrication of SiGe MEMS structures with high intrinsic ESD robustness

S. Sangameswaran, V. Cherman, J. de Coster, A. Witvrouw, G. Groeseneken, I. De Wolf
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Abstract

The mechanical response of electrostatically-actuated MEMS to ESD stress leads to contact breakdown or to discharges across micro-gaps. This is the root cause of most MEMS failures under ESD stress. This paper discusses improvement of the intrinsic ESD robustness of SiGe MEMS from Class0 (<;250V) to more than Class1 (>;500V), through smart design variations and higher mechanical stiffness. A MEMS-based one-time ESD-protection fuse with pre-defined trigger voltage is shown as an application.
高ESD稳健性SiGe MEMS结构的设计与制造
静电驱动的MEMS对ESD应力的机械响应导致接触击穿或跨微间隙放电。这是大多数MEMS在ESD压力下失效的根本原因。本文讨论了通过智能设计变化和更高的机械刚度,从Class0 (;500V)开始提高SiGe MEMS的固有ESD稳健性。一种基于mems的一次性esd保护熔断器,具有预先定义的触发电压。
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