The impact of stencil aperture design for next generation ultra-fine pitch printing

M. Whitmore, J. Schake, C. Ashmore
{"title":"The impact of stencil aperture design for next generation ultra-fine pitch printing","authors":"M. Whitmore, J. Schake, C. Ashmore","doi":"10.1109/IEMT.2012.6521805","DOIUrl":null,"url":null,"abstract":"Miniaturisation is pushing the stencil printing process. As features become smaller, solder paste transfer efficiency is becoming more critical. In latest research work, actual paste deposit volumes and transfer efficiency have been monitored and compared for both square and round apertures with area ratio's ranging from 0.20 thru to 1.35. This covers apertures sizes of between 100 and 550 microns in a nominal 100 micron thick stencil foil. In addition, the effect of ultrasonically activated squeegees (ProActiv) has been assessed as part of the same experiment. A further comparison has also been made between type 4 and type 4.5 solder paste aswell. The data presented here will help provide guidelines for stencil aperture designs and strategies for ultra-fille pitch components such as 0.3CSP's.","PeriodicalId":315408,"journal":{"name":"2012 35th IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 35th IEEE/CPMT International Electronics Manufacturing Technology Conference (IEMT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEMT.2012.6521805","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

Miniaturisation is pushing the stencil printing process. As features become smaller, solder paste transfer efficiency is becoming more critical. In latest research work, actual paste deposit volumes and transfer efficiency have been monitored and compared for both square and round apertures with area ratio's ranging from 0.20 thru to 1.35. This covers apertures sizes of between 100 and 550 microns in a nominal 100 micron thick stencil foil. In addition, the effect of ultrasonically activated squeegees (ProActiv) has been assessed as part of the same experiment. A further comparison has also been made between type 4 and type 4.5 solder paste aswell. The data presented here will help provide guidelines for stencil aperture designs and strategies for ultra-fille pitch components such as 0.3CSP's.
模板孔径设计对下一代超细间距印刷的影响
小型化正在推动模板印刷工艺的发展。随着特征越来越小,锡膏转移效率变得越来越重要。在最新的研究工作中,对面积比为0.20 ~ 1.35的方形孔和圆形孔的膏体沉积体积和传递效率进行了监测和比较。这包括在标称100微米厚的模板箔上的孔径尺寸在100到550微米之间。此外,超声波激活刮刀(ProActiv)的效果也作为同一实验的一部分进行了评估。进一步的比较也作出了4型和4.5型锡膏之间以及。这里提供的数据将有助于为超填充螺距元件(如0.3 3csp)的模板孔径设计和策略提供指导。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信