{"title":"Ultralow on-resistance 30–40 V UMOSFET by 2-D scaling of ion-implanted superjunction structure","authors":"Hisanori Okubo, Kenya Kobayashi, Y. Kawashima","doi":"10.1109/ISPSD.2013.6694403","DOIUrl":null,"url":null,"abstract":"We present an ultimately narrow pitch superjunction UMOSFET (SJ-UMOS) with a record low specific on-resistance (Rsp) for automotive applications. This high performance device was designed by not only shrinkage of lateral p/n pitch, but reduction of longitudinal dimension for voltage sustaining region including ion-implanted p-columns. The refined technologies brought us a fully depleted SJ structure with extremely scaled pitch to a minimum of 1.0 μm. In the developed SJ-UMOS, an ultralow Rsp (VGS = 10 V) of 4.75 miimm2 (2.95 miimm2 without a substrate component) at a breakdown voltage of 32.8 V was obtained. We also confirmed excellent properties of low RonQG FOM and soft recovery operation of a body diode due to the best architecture around the gate electrode of the MOSFET.","PeriodicalId":175520,"journal":{"name":"2013 25th International Symposium on Power Semiconductor Devices & IC's (ISPSD)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-05-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 25th International Symposium on Power Semiconductor Devices & IC's (ISPSD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2013.6694403","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 8
Abstract
We present an ultimately narrow pitch superjunction UMOSFET (SJ-UMOS) with a record low specific on-resistance (Rsp) for automotive applications. This high performance device was designed by not only shrinkage of lateral p/n pitch, but reduction of longitudinal dimension for voltage sustaining region including ion-implanted p-columns. The refined technologies brought us a fully depleted SJ structure with extremely scaled pitch to a minimum of 1.0 μm. In the developed SJ-UMOS, an ultralow Rsp (VGS = 10 V) of 4.75 miimm2 (2.95 miimm2 without a substrate component) at a breakdown voltage of 32.8 V was obtained. We also confirmed excellent properties of low RonQG FOM and soft recovery operation of a body diode due to the best architecture around the gate electrode of the MOSFET.