{"title":"The 300mm Technology Current Status And Future Prospect","authors":"Komiya","doi":"10.1109/VLSIT.1997.623667","DOIUrl":null,"url":null,"abstract":"Development of the 300¿ technology is approaching the exciting part of the program. The transition in the wafer diameter fiom 200¿ to 300¿ is expected to result in the chip cost reduction by the range of 1.520% and to decrease the investment in the production line down to about 65%. The technological key issues would be the crystal growth and the heat treatment. World-wide cooperative efforts are being made for the evaluation of the equipment and materials and for the standardiition.","PeriodicalId":414778,"journal":{"name":"1997 Symposium on VLSI Technology","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-06-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1997 Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.1997.623667","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
Development of the 300¿ technology is approaching the exciting part of the program. The transition in the wafer diameter fiom 200¿ to 300¿ is expected to result in the chip cost reduction by the range of 1.520% and to decrease the investment in the production line down to about 65%. The technological key issues would be the crystal growth and the heat treatment. World-wide cooperative efforts are being made for the evaluation of the equipment and materials and for the standardiition.