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Creation of Slow Traps in MOS Capacitors furing RF Plasma Etching

Proceedings of 1st International Symposium on Plasma Process-Induced Damage Pub Date : 1996-05-14 DOI:10.1109/PPID.1996.715231
P. Tanner, S. Dimitrijev, Y. Yeow, H. B. Harrison
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射频等离子体蚀刻过程中MOS电容器中慢阱的产生
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Proceedings of 1st International Symposium on Plasma Process-Induced Damage
Proceedings of 1st International Symposium on Plasma Process-Induced Damage
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