F. Iucolano, A. Parisi, Santo Reina, A. Patti, S. Coffa, G. Meneghesso, G. Verzellesi, F. Fantini, A. Chini
{"title":"Correlation between dynamic Rdsou transients and Carbon related buffer traps in AlGaN/GaN HEMTs","authors":"F. Iucolano, A. Parisi, Santo Reina, A. Patti, S. Coffa, G. Meneghesso, G. Verzellesi, F. Fantini, A. Chini","doi":"10.1109/IRPS.2016.7574586","DOIUrl":null,"url":null,"abstract":"The on resistance increment observed when the device is operated at high drain-source voltages is one the topics that limits the performance of the AlGaN/GaN HEMT devices. In this paper, the physical mechanisms responsible of the RDSon degradation are investigated. The dynamic RDSon transient method is used in order to get insight to characterize the traps states. By calculating the Arrhenius plot associated with the RDSon transients an activation energy of 0.86eV was extracted, that can be correlated to the traps due to the incorporation of Carbon inside the buffer. This hypothesis was further supported by the analyses performed on a simpler structure (TLM). By applying a negative substrate bias the effect of only the buffer traps was studied. A fairly close value of the activation energy (0.9eV) to the one extracted when analyzing the RDSon transient was obtained.","PeriodicalId":172129,"journal":{"name":"2016 IEEE International Reliability Physics Symposium (IRPS)","volume":"67 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-04-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"16","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE International Reliability Physics Symposium (IRPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.2016.7574586","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 16
Abstract
The on resistance increment observed when the device is operated at high drain-source voltages is one the topics that limits the performance of the AlGaN/GaN HEMT devices. In this paper, the physical mechanisms responsible of the RDSon degradation are investigated. The dynamic RDSon transient method is used in order to get insight to characterize the traps states. By calculating the Arrhenius plot associated with the RDSon transients an activation energy of 0.86eV was extracted, that can be correlated to the traps due to the incorporation of Carbon inside the buffer. This hypothesis was further supported by the analyses performed on a simpler structure (TLM). By applying a negative substrate bias the effect of only the buffer traps was studied. A fairly close value of the activation energy (0.9eV) to the one extracted when analyzing the RDSon transient was obtained.