Hot carrier reliability characterization in consideration of self-heating in FinFET technology

M. Jin, Changze Liu, Jinju Kim, Jungin Kim, S. Choo, Yoohwan Kim, H. Shim, Lijie Zhang, K. Nam, Jongwoo Park, S. Pae, Haebum Lee
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引用次数: 51

Abstract

A severity of hot carrier injection (HCI) in PFET becomes worse than NFET at elevated temperatures. This new observation is further found to be due to the coupled self-heating effects (SHE) during DC HCI stress (also a higher Ea in PFET HCI), rather than the negative bias temperature instability (NBTI) effect during HCI stress. Furthermore, in order to guarantee the precise estimation of HCI under circuit level AC condition, a new empirical HCI lifetime model decoupled from the SHE is proposed, which is further verified by the Si data from nanosecond pulsed waveform HCI stress and Ring Oscillator stress results.
考虑FinFET技术自热的热载流子可靠性表征
在高温下,fet中的热载流子注入(HCI)的严重程度比net更差。这一新的观察结果进一步发现是由于直流HCI应力期间的耦合自热效应(SHE)(在fet HCI中也有更高的Ea),而不是HCI应力期间的负偏置温度不稳定性(NBTI)效应。此外,为了保证电路级交流条件下HCI的精确估计,提出了一种新的与SHE解耦的经验HCI寿命模型,并通过纳秒脉冲波形HCI应力和环振荡器应力结果的Si数据进一步验证了该模型。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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