L-UTSOI: A compact model for low-power analog and digital applications in FDSOI technology

S. Martinie, O. Rozeau, T. Poiroux, P. Scheer, Salim El Ghouli, Mihyun Kang, A. Juge, Harrison Lee
{"title":"L-UTSOI: A compact model for low-power analog and digital applications in FDSOI technology","authors":"S. Martinie, O. Rozeau, T. Poiroux, P. Scheer, Salim El Ghouli, Mihyun Kang, A. Juge, Harrison Lee","doi":"10.23919/SISPAD49475.2020.9241684","DOIUrl":null,"url":null,"abstract":"With the maturity of CMOS technologies and their use for low power various analog and digital applications, some additional effects must be modeled or enhanced to improve the accuracy of SPICE models. Indeed, with the decrease of supply voltages/currents and the use of the back bias in Fully-Depleted Silicon On Insulator (FDSOI) technologies, the devices operate close to the weak-moderate inversion, where gm/Id Figure is impacted by effects like the depletion of source/drain electrodes and the parasitic currents such as Impact ionization current in moderate inver-sion and Gate Leakage current in weak inversion, can have a significant impact on the model accuracy. This paper describes the latest significant improvements of L-UTSOI model (formerly Leti-UTSOI) related to version 102.4. These model extensions are validated against Silicon experimental data.","PeriodicalId":206964,"journal":{"name":"2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"12 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/SISPAD49475.2020.9241684","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

With the maturity of CMOS technologies and their use for low power various analog and digital applications, some additional effects must be modeled or enhanced to improve the accuracy of SPICE models. Indeed, with the decrease of supply voltages/currents and the use of the back bias in Fully-Depleted Silicon On Insulator (FDSOI) technologies, the devices operate close to the weak-moderate inversion, where gm/Id Figure is impacted by effects like the depletion of source/drain electrodes and the parasitic currents such as Impact ionization current in moderate inver-sion and Gate Leakage current in weak inversion, can have a significant impact on the model accuracy. This paper describes the latest significant improvements of L-UTSOI model (formerly Leti-UTSOI) related to version 102.4. These model extensions are validated against Silicon experimental data.
L-UTSOI:用于FDSOI技术中低功耗模拟和数字应用的紧凑型模型
随着CMOS技术的成熟及其在低功耗各种模拟和数字应用中的应用,必须对一些附加效应进行建模或增强以提高SPICE模型的精度。事实上,随着电源电压/电流的降低以及在完全耗尽的绝缘体上硅(FDSOI)技术中使用反偏置,器件工作接近弱-中等反转,其中gm/Id图受到源极/漏极耗尽和寄生电流(如中等反转中的冲击电离电流和弱反转中的栅漏电流)等效应的影响,可能对模型精度产生重大影响。本文描述了L-UTSOI模型(原Leti-UTSOI)与102.4版本相关的最新重大改进。这些模型扩展通过硅实验数据进行了验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信