RTP uniformity improvement through simulation

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. Pub Date : 2004-09-28 DOI:10.1109/RTP.2004.1441962

C. Tanasa, J. Ranish, A. Hunter, S. Ramamurthy, R. Jallepally, B. Ramachandran, C. Lai, A. Tjandra, N. Tam

引用次数: 0

Abstract

Some RTP chamber non-uniformity is due to the lamp arrangement geometry. An internally written simulation program was written to reproduce this non-uniformity. The results of the simulation were successfully tested against experimental results. The simulation then lead to finding lamp types and lamp combination recipes which decrease overall non-uniformity in the RTP chamber by 40%

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通过仿真改进RTP均匀性

一些RTP室的不均匀性是由于灯的排列几何。为了重现这种不均匀性，编写了一个内部编写的模拟程序。仿真结果与实验结果进行了验证。通过模拟，我们找到了能够将RTP室的整体不均匀性降低40%的灯的类型和灯的组合配方

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.

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