Novel Enhanced-Planar IGBT Technology Rated up to 6.5kV for Lower Losses and Higher SOA Capability

Munaf T. A. Rahimo, A. Kopta, S. Linder
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引用次数: 76

Abstract

In this paper, we introduce an IGBT planar technology, which sets a new performance benchmark in terms of losses and SOA capability. The improved trade-off relationship between on-state losses Vce(sat) and turn-off losses Eoff (i.e. technology curve) was solely realized by means of planar cell enhancement. Simultaneously, high levels of turn-off ruggedness (RBSOA) were obtained with the new cell design. The enhanced-planar IGBT technology is implemented on the soft-punch-through (SPT) buffer concept for ensuring controllable and soft switching behaviour. The paper covers design details of the enhanced-planar technology and a full set of results for the 6500V EP-IGBT chip
新型增强型平面IGBT技术,额定电压高达6.5kV,具有更低的损耗和更高的SOA能力
在本文中,我们介绍了一种IGBT平面技术,该技术在损耗和SOA能力方面设定了新的性能基准。改进的导通损耗Vce(sat)与关断损耗Eoff(即技术曲线)之间的权衡关系仅通过平面细胞增强实现。同时,新的电池设计获得了高水平的关断坚固性(RBSOA)。增强平面IGBT技术是在软穿孔(SPT)缓冲概念上实现的,以确保可控和软开关行为。本文介绍了增强平面技术的设计细节和6500V EP-IGBT芯片的全套结果
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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