100 mm diameter mono-crystalline 4H-SiC/polycrystalline-SiC bonded wafers fabricated by SAB for power device

K. Yagi, N. Hatta, T. Sakata, A. Minami, T. Kawahara, H. Uchida, K. Imaoka, T. Okuda, J. Suda, Y. Kurashima, H. Takagi
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引用次数: 1

Abstract

We have developed 100mm in diameter 4H-SiC/poly-SiC bonded wafer by SAB method. The SiC bonded wafer demonstrated an excellent thermal stability against device processing temperature. SBDs fabricated on the SiC bonded wafer exhibited good I-V characteristics. These results suggest that it is a promising alternative wafer for SiC power device.
采用SAB工艺制备了直径为100mm的单晶4H-SiC/多晶sic结合晶圆
我们用SAB法开发了直径为100mm的4H-SiC/聚sic键合硅片。SiC晶圆在器件加工温度下表现出优异的热稳定性。在SiC晶圆上制备的sdd具有良好的I-V特性。这些结果表明,它是一种很有前途的SiC功率器件替代晶圆。
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