Accurate defect die placement and nuisance defect reduction for reticle die-to-die inspections

Vincent Wen, L. R. Huang, C. J. Lin, Y. N. Tseng, W. H. Huang, L. Tuo, Mark P. Wylie, E. Chen, Elvik Wang, Joshua Glasser, Amrish Kelkar, David Wu
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引用次数: 1

Abstract

Die-to-die reticle inspections are among the simplest and most sensitive reticle inspections because of the use of an identical-design neighboring-die for the reference image. However, this inspection mode can have two key disadvantages: (1) The location of the defect is indeterminate because it is unclear to the inspector whether the test or reference image is defective; and (2) nuisance and false defects from mask manufacturing noise and tool optical variation can limit the usable sensitivity. The use of a new sequencing approach for a die-to-die inspection can resolve these issues without any additional scan time, without sacrifice in sensitivity requirement, and with a manageable increase in computation load. In this paper we explore another approach for die-to-die inspections using a new method of defect processing and sequencing. Utilizing die-to-die double arbitration during defect detection has been proven through extensive testing to generate accurate placement of the defect in the correct die to ensure efficient defect disposition at the AIMS step. The use of this method maintained the required inspection sensitivity for mask quality as verified with programmed-defectmask qualification and then further validated with production masks comparing the current inspection approach to the new method. Furthermore, this approach can significantly reduce the total number of defects that need to be reviewed by essentially eliminating the nuisance and false defects that can result from a die-to-die inspection. This "double-win" will significantly reduce the effort in classifying a die-to-die inspection result and will lead to improved cycle times.
准确的缺陷模具定位和减少讨厌的缺陷,为网线模具到模具的检查
由于使用相同设计的相邻模具作为参考图像,模对模的十字线检查是最简单和最敏感的十字线检查之一。然而,这种检测模式有两个关键的缺点:(1)缺陷的位置是不确定的,因为检查员不清楚测试或参考图像是否有缺陷;(2)掩模制造噪声和工具光学变化带来的干扰和虚假缺陷会限制可用灵敏度。使用新的测序方法进行模对模检测可以解决这些问题,而不需要任何额外的扫描时间,不需要牺牲灵敏度要求,并且可以管理地增加计算负载。在本文中,我们探索了另一种方法,模具到模具的检验使用一种新的方法的缺陷处理和排序。在缺陷检测期间利用模具对模具的双重仲裁已经通过广泛的测试证明,可以在正确的模具中生成准确的缺陷位置,以确保在AIMS步骤中有效地处理缺陷。该方法的使用保持了所需的口罩质量检测灵敏度,并通过程序化缺陷口罩鉴定进行了验证,然后用生产口罩进行了进一步验证,将当前的检测方法与新方法进行了比较。此外,这种方法可以通过本质上消除从模具到模具的检查中产生的麻烦和错误缺陷,从而显著地减少需要审查的缺陷总数。这种“双赢”将大大减少分类模具到模具检验结果的工作量,并将导致改进的周期时间。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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