Challenges in Reliability Assessment of Advanced CMOS Technologies

G. Groeseneken, R. Degraeve, B. Kaczer, P. Roussel
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引用次数: 6

Abstract

In this paper it was demonstrated that by applying the classical way of reliability lifetime prediction, the reliability of a product can no longer be guaranteed in some cases and for some failure mechanisms. This is caused by reduced reliability margins under the influence of increasing fields, current and power densities on the one hand, by introduction of new materials and devices on the other hand, and by ever increasing failure rate requirements imposed by the market. As a result, the reliability engineers have started to rethink the classical reliability assessment methodology. By taking into account the changes in failure behavior and statistics under influence of scaling trends, and analyzing the impact of such failures on the device and circuit operation, new reliability margins can be gained. This will, however, require more interaction between technology, reliability and design engineers, in order to define realistic failure specifications and new chip failure criteria for each type of circuit. In this paper some elements of such a new reliability assessment methodology have been demonstrated by using oxide breakdown as the failure mechanism for a case study where the classical reliability margins are already reduced to zero. It is expected, however, that for most of the other failure mechanisms a similar trend will emerge, and similar solutions, requiring the interaction with design engineers, will be necessary.
先进CMOS技术可靠性评估的挑战
本文论证了应用经典的可靠性寿命预测方法,在某些情况下,对于某些失效机制,产品的可靠性是无法得到保证的。这一方面是由于在不断增加的磁场、电流和功率密度的影响下可靠性边际降低,另一方面是由于引入新材料和设备,以及市场施加的故障率要求不断增加。因此,可靠性工程师开始对传统的可靠性评估方法进行反思。通过考虑在缩放趋势影响下的故障行为和统计变化,并分析此类故障对器件和电路运行的影响,可以获得新的可靠性裕度。然而,这将需要技术、可靠性和设计工程师之间更多的互动,以便为每种类型的电路定义现实的故障规格和新的芯片故障标准。在本文中,这种新的可靠性评估方法的一些元素已经通过使用氧化物击穿作为失效机制的案例研究,其中经典的可靠性裕度已经降低到零。然而,预计对于大多数其他失效机制,将出现类似的趋势,并且需要与设计工程师进行交互的类似解决方案将是必要的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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