{"title":"Optimizing Production Performance Through Trace-Level Chamber Analysis","authors":"K. Gan, T. Ho, Joe Lee","doi":"10.23919/eMDC/ISSM48219.2019.9052132","DOIUrl":null,"url":null,"abstract":"In semiconductor manufacturing, individual process chamber integrity needs to be maintained. This is achieved through regular chamber cleaning and process kit replacement. Chamber to chamber matching is also critical for process quality control. When chambers are performing the same task, they are expected to produce statistically similar output. The matching needs to be maintained through cleaning cycles and verified after each maintenance event.","PeriodicalId":398770,"journal":{"name":"2019 Joint International Symposium on e-Manufacturing & Design Collaboration(eMDC) & Semiconductor Manufacturing (ISSM)","volume":"33 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 Joint International Symposium on e-Manufacturing & Design Collaboration(eMDC) & Semiconductor Manufacturing (ISSM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/eMDC/ISSM48219.2019.9052132","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
In semiconductor manufacturing, individual process chamber integrity needs to be maintained. This is achieved through regular chamber cleaning and process kit replacement. Chamber to chamber matching is also critical for process quality control. When chambers are performing the same task, they are expected to produce statistically similar output. The matching needs to be maintained through cleaning cycles and verified after each maintenance event.