Optimizing Production Performance Through Trace-Level Chamber Analysis

K. Gan, T. Ho, Joe Lee
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引用次数: 1

Abstract

In semiconductor manufacturing, individual process chamber integrity needs to be maintained. This is achieved through regular chamber cleaning and process kit replacement. Chamber to chamber matching is also critical for process quality control. When chambers are performing the same task, they are expected to produce statistically similar output. The matching needs to be maintained through cleaning cycles and verified after each maintenance event.
通过痕量级室分析优化生产性能
在半导体制造中,需要保持单个工艺室的完整性。这可以通过定期清洗腔室和更换工艺套件来实现。腔室之间的匹配对于过程质量控制也是至关重要的。当各室执行相同的任务时,它们预计会产生统计上相似的输出。匹配需要通过清洗周期进行维护,并在每次维护事件后进行验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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