Theoretical investigation on surface kinetics of the SiC single crystal growth

Peng Yan, Y. Xianglong, Cheng Xiufang, Hu Xiaobo, Xu Xiangang, Yu Peng, W. Ruiqi
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引用次数: 0

Abstract

According to the BCF theory, a simple surface diffusion model of SiC single crystal was established, and the key parameters such as the surface diffusion length, the critical nucleation and growth rate were obtained by theoretical calculation. The results show that surface diffusion length is 460nmat 2400K and it decreases with the rise of temperature. The relationship between the critical nucleation and the temperature was analyzed. For silicon surface, the critical saturation is decreased with the increase of temperature. Compared with silicon surface, the critical saturation of carbon surface is smaller and almost constant with the increase of temperature. That means, under the same saturation, two-dimensional nucleation occurs on the carbon surface. The growth rate of SiC was obtained using the surface diffusion length, the critical saturation and chemical equilibrium constant of reaction system. And the value was in agreement with the experimental results.
碳化硅单晶生长的表面动力学理论研究
根据 BCF 理论,建立了简单的 SiC 单晶表面扩散模型,并通过理论计算得到了表面扩散长度、临界成核和生长速率等关键参数。结果表明,表面扩散长度在 2400K 时为 460nm,且随温度升高而减小。分析了临界成核与温度之间的关系。对于硅表面,临界饱和度随温度升高而降低。与硅表面相比,碳表面的临界饱和度较小,且几乎不变。这说明,在相同的饱和度下,碳表面会出现二维形核。利用反应体系的表面扩散长度、临界饱和度和化学平衡常数得出了碳化硅的生长速率。该值与实验结果一致。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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