{"title":"High resolution micro ultrasonic machining (HR-μUSM) for post-fabrication trimming of fused silica 3-D microstructures","authors":"A. Viswanath, Tao Li, Y. Gianchandani","doi":"10.1109/MEMSYS.2014.6765685","DOIUrl":null,"url":null,"abstract":"This paper presents the design and characterization of a high resolution micro ultrasonic machining (HR-μUSM) process suitable for post-fabrication trimming of 3-D microstructures made from fused silica and other materials. The process targets low machining rates, high resolution, and high surface quality. On flat fused silica substrates, the process achieves machining rates ≤10 nm/sec averaged over 1 minute. The average surface roughness (Sa) achieved is ≤30 nm. The process is successfully demonstrated for trimming hemispherical 3-D microstructures made from fused silica.","PeriodicalId":312056,"journal":{"name":"2014 IEEE 27th International Conference on Micro Electro Mechanical Systems (MEMS)","volume":"3 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-03-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"11","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 IEEE 27th International Conference on Micro Electro Mechanical Systems (MEMS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MEMSYS.2014.6765685","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 11
Abstract
This paper presents the design and characterization of a high resolution micro ultrasonic machining (HR-μUSM) process suitable for post-fabrication trimming of 3-D microstructures made from fused silica and other materials. The process targets low machining rates, high resolution, and high surface quality. On flat fused silica substrates, the process achieves machining rates ≤10 nm/sec averaged over 1 minute. The average surface roughness (Sa) achieved is ≤30 nm. The process is successfully demonstrated for trimming hemispherical 3-D microstructures made from fused silica.