An enhanced model for thin film resistor matching

Abstract

This paper presents an improved model which estimates the geometry required to achieve a desired matching target for rectangular resistors in a semiconductor process. A methodology is explained for estimating the model parameters involved. Measured data is presented which covers an extensive range of geometries on a particular thin film process, and the estimation methodology is followed to derive appropriate model parameters. Using this new model, insights into the underlying error sources for the process are obtained.