Hot carrier degradation in nanowire transistors: Physical mechanisms, width dependence and impact of Self-Heating

A. Laurent, X. Garros, S. Barraud, G. Mariniello, G. Reimbold, D. Roy, E. Vincent, G. Ghibaudo
{"title":"Hot carrier degradation in nanowire transistors: Physical mechanisms, width dependence and impact of Self-Heating","authors":"A. Laurent, X. Garros, S. Barraud, G. Mariniello, G. Reimbold, D. Roy, E. Vincent, G. Ghibaudo","doi":"10.1109/VLSIT.2016.7573374","DOIUrl":null,"url":null,"abstract":"We present an extensive study of Hot Carrier reliability in N-Ωfet nanowires. For the first time 3 HC degradation modes were clearly evidenced as in planar technology and accurately modeled. Moreover HC reliability was proved to be width-independent. Finally it is shown that, although SH is important in nanowires, it has almost no implication on its HC reliability because of the weak temperature dependence of the HC mechanisms.","PeriodicalId":129300,"journal":{"name":"2016 IEEE Symposium on VLSI Technology","volume":"2013 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"15","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.2016.7573374","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 15

Abstract

We present an extensive study of Hot Carrier reliability in N-Ωfet nanowires. For the first time 3 HC degradation modes were clearly evidenced as in planar technology and accurately modeled. Moreover HC reliability was proved to be width-independent. Finally it is shown that, although SH is important in nanowires, it has almost no implication on its HC reliability because of the weak temperature dependence of the HC mechanisms.
纳米线晶体管的热载流子降解:物理机制、宽度依赖和自热影响
我们对N-Ωfet纳米线的热载流子可靠性进行了广泛的研究。首次在平面技术上清晰地证明了3种HC降解模式,并进行了精确的建模。此外,HC信度与宽度无关。最后表明,尽管高温在纳米线中很重要,但由于高温机制的弱温度依赖性,它对纳米线的高温可靠性几乎没有影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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