Y. Toyota, So Watanabe, Taiga Arai, M. Wakagi, M. Mori, Masashi Shinagawa, K. Azuma, Yuji Shima, T. Oda, Y. Toyoda, K. Saito
{"title":"Novel 3.3-kV advanced trench HiGT with low loss and low dv/dt noise","authors":"Y. Toyota, So Watanabe, Taiga Arai, M. Wakagi, M. Mori, Masashi Shinagawa, K. Azuma, Yuji Shima, T. Oda, Y. Toyoda, K. Saito","doi":"10.1109/ISPSD.2013.6694391","DOIUrl":null,"url":null,"abstract":"Novel 3.3-kV trench IGBT with low loss and low dv<sub>AK</sub>/dt noise was developed. The structural feature of the IGBTs is deep p-WELL layers separated from trench gates. This structure suppresses excess V<sub>GE</sub> overshoot and then reduces recovery dv<sub>AK</sub>/dt. Moreover, this effect is enhanced by reducing the resistance of the deep p-WELL layers (R<sub>FP</sub>). It was found that, for the first time, the trade-off characteristics between V<sub>CEsat</sub> and recovery dv<sub>AK</sub>/dt were drastically improved by separating p-WELL layers from trench gates and decreasing R<sub>FP</sub>. The recovery dv<sub>AK</sub>/dt could be reduced by 79% more than that for the conventional trench IGBT, maintaining a small V<sub>CEsat</sub> and E<sub>on</sub> equal to the conventional one.","PeriodicalId":175520,"journal":{"name":"2013 25th International Symposium on Power Semiconductor Devices & IC's (ISPSD)","volume":"73 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-05-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"28","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 25th International Symposium on Power Semiconductor Devices & IC's (ISPSD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2013.6694391","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 28
Abstract
Novel 3.3-kV trench IGBT with low loss and low dvAK/dt noise was developed. The structural feature of the IGBTs is deep p-WELL layers separated from trench gates. This structure suppresses excess VGE overshoot and then reduces recovery dvAK/dt. Moreover, this effect is enhanced by reducing the resistance of the deep p-WELL layers (RFP). It was found that, for the first time, the trade-off characteristics between VCEsat and recovery dvAK/dt were drastically improved by separating p-WELL layers from trench gates and decreasing RFP. The recovery dvAK/dt could be reduced by 79% more than that for the conventional trench IGBT, maintaining a small VCEsat and Eon equal to the conventional one.