Surface Profile and Optical Properties of Sb-doped SnO2 Thin Films

S. D. Hutagalung, B.Y. Lee
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引用次数: 3

Abstract

Tin oxide (SnO2) and antimony-doped tin oxide (SnO2:Sb) thin films were deposited on the microscope slide glass substrates by sol-gel dip coating technique. Precursor solution was prepared using tin(IV) chloride pentahydrate, antimony chloride, urea, and hydrochloric acid. The Sb dopant concentration was varied from 1 to 4 mol% to investigate the effect of doping on the optical and surface roughness of the films. AFM image showed that undoped films having a very smooth surface morphology with nanostructure grain size in the range of 37.6 to 56.3 nm. Meanwhile, Sb-doped SnO2 was more roughness if compared to undoped one. The optical properties of the films have been studied from transmission spectra in the ultraviolet-visible wavelength range. Energy gap of Sb-doped SnO2 thin films are in the range of 4.07-4.11 eV, shifted to the lower value with increased doping concentration.
sb掺杂SnO2薄膜的表面轮廓和光学性质
采用溶胶-凝胶浸涂技术在载玻片衬底上制备了氧化锡(SnO2)和掺锑氧化锡(SnO2:Sb)薄膜。用五水氯化锡、氯化锑、尿素和盐酸配制前驱体溶液。Sb掺杂浓度在1 ~ 4 mol%范围内变化,考察掺杂对薄膜光学性能和表面粗糙度的影响。AFM图像显示,未掺杂的薄膜表面形貌非常光滑,纳米结构晶粒尺寸在37.6 ~ 56.3 nm之间。同时,与未掺杂的SnO2相比,sb掺杂的SnO2粗糙度更大。从紫外-可见光透射光谱研究了薄膜的光学性能。sn掺杂SnO2薄膜的能隙在4.07-4.11 eV之间,随着掺杂浓度的增加,能隙逐渐减小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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