W. Lepkowski, S. Wilk, B. Bakkaloglu, P. Fechner, T. Thornton
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引用次数: 3
Abstract
With these promising preliminary results, the next phase is to complete a fully integrated design similar to that in [1] on the 150nm SOI CMOS process. Ideally the performance will improve with respect to the transient responses and Ignd since the error amplifier can be optimally designed for the needs of the MESFET LDO.