{"title":"1200 V, 150 A insulated-gate thyristors","authors":"J. Ajit, D. Kinzer","doi":"10.1109/ISPSD.1995.515005","DOIUrl":null,"url":null,"abstract":"A insulated-gate thyristor (IGTH) design for achieving high controllable current capability is described. A square-cellular design with high density of MOS-channels modulating the resistance of the base region of the NPN transistor of the thyristor structure is-used. The IGTH was fabricated using a double-diffused DMOS process and 1200 V devices with controllable currents in excess of 150 A were obtained.","PeriodicalId":200109,"journal":{"name":"Proceedings of International Symposium on Power Semiconductor Devices and IC's: ISPSD '95","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of International Symposium on Power Semiconductor Devices and IC's: ISPSD '95","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.1995.515005","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7
Abstract
A insulated-gate thyristor (IGTH) design for achieving high controllable current capability is described. A square-cellular design with high density of MOS-channels modulating the resistance of the base region of the NPN transistor of the thyristor structure is-used. The IGTH was fabricated using a double-diffused DMOS process and 1200 V devices with controllable currents in excess of 150 A were obtained.