Linda Jäckel, A. Zienert, Erik E. Lorenz, Max Huber, J. Schuster
{"title":"Multi-scale simulation of epitaxial processes","authors":"Linda Jäckel, A. Zienert, Erik E. Lorenz, Max Huber, J. Schuster","doi":"10.1109/IITC/MAM57687.2023.10154676","DOIUrl":null,"url":null,"abstract":"We present a multi-scale modeling strategy to investigate and optimize epitaxial growth. As example processes, we study Si and SiGe epitaxial films in various equipments. While reactor-scale and feature-scale simulation approaches are useful on themselves, only the combination of both approaches is capable of fully capturing the physical and chemical processes of epitaxial growth on structured substrates.","PeriodicalId":241835,"journal":{"name":"2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM)","volume":"10 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IITC/MAM57687.2023.10154676","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
We present a multi-scale modeling strategy to investigate and optimize epitaxial growth. As example processes, we study Si and SiGe epitaxial films in various equipments. While reactor-scale and feature-scale simulation approaches are useful on themselves, only the combination of both approaches is capable of fully capturing the physical and chemical processes of epitaxial growth on structured substrates.